Chemelex DX-40—40% potassium carbonate with additives for extended bath life, higher yields and faster speeds.
Chemelex Sodium Carbonate Solution—One-part concentrate formulated to develop fully aqueous dry film photoresist.
Chemelex ADF-30—Strong, consistent performance
on a wide variety of photoresists. More anti- tarnish for a brighter copper
finish. Large particle size for easy filtration.
Chemelex ADF-35—Low VOC formula for inner
layer stripping. Contains anti-tarnish for bright, uniform copper appearance
and produces large particles for easy filtration and prolonged bath life.
Chemelex MICROSTRIP 2000—Semi-aqueous stripper with additives for increased penetration into two to three mil lines and spaces.