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Printed Circuit Materials-Chemistry

Chemelex DX-40—40% potassium carbonate with additives for extended bath life, higher yields and faster speeds.

Chemelex Sodium Carbonate Solution—One-part concentrate formulated to develop fully aqueous dry film photoresist.

Chemelex ADF-30—Strong, consistent performance on a wide variety of photoresists. More anti- tarnish for a brighter copper finish. Large particle size for easy filtration.

Chemelex ADF-35—Low VOC formula for inner layer stripping. Contains anti-tarnish for bright, uniform copper appearance and produces large particles for easy filtration and prolonged bath life.

Chemelex MICROSTRIP 2000—Semi-aqueous stripper with additives for increased penetration into two to three mil lines and spaces.

Chemelex

   
 
 





Etchomatic Celebrates 58 Years!